The PIs successfully fabricated the newly designed BiVO4-coated WO3 semiconductor-based photoanodes for the use in photoelectrochemical degradation of benzotriazole (BTA), one of the azole compounds in wastewater from the CMP slurries used in the semiconductor manufacturing process. While this current work demonstrated promising degradation activity, further optimization is needed, particularly in controlling the morphology of the metal oxide substrates, to enhance the catalytic performance of the photoanodes. Building on these preliminary results, we submitted a proposal to the 2025 NIST CHIPS AIAE Sustainability Program titled “AI-Driven Autonomous Systems for Eco-Friendly CMP Components in Sustainable Semiconductor Manufacturing.”
